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The Influence of Prediction on Vergence Eye-Movements

作者:科技文献资料网 时间:2018-10-19 15:47:00  浏览:8206   来源:科技文献资料网
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[唯一标识符]:CDSTIC.ISTP.1104696
[文献来源]:科学技术会议录索引(ISTP)
[文献类型]:科技会议
[标题]:The Influence of Prediction on Vergence Eye-Movements
[作者]:WH Yuan;JL Semmlow;P Munoz
[出版单位]:I E E ENew York
[ISSN_ISBN]:0-7803-4544-4
[会议名称]:IEEE 24th Annual Northeast Bioengineering Conference,Hershey, PA,April 9-10, 1998
[来源]:PROCEEDINGS OF THE IEEE 24TH ANNUAL NORTHEAST BIOENGINEERING CONFERENCE,pp 56-57
[编辑者]:ES Wolpert;WJ Weiss;RP Gaumond
[主办单位]:IEEE
[地址]:WH Yuan,Rutgers_State_Univ, Dept Biomed Engn, New Brunswick, NJ 08903 USA
[专业领域]:Engineering, Biomedical
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[文献类型]:科技报告
[标题]:Design,Analysis and Test Verification of Advanced Encapsulation Systems.
[作者]:garcia, a. iii kallis, j. m.
[机构]:Spectrolab,Inc., Sylmar,CA.*National Aeronautics and Space Administration,Washington,DC.
[关键词]:encapsulating,optical properties,thermodynamic properties,electrical properties,qualifications,structural analysis,
[出版年份]:1983
[报告号]:NAS 1.26:172985, DOE/JPL-955567-83/11
[报告时间]:Jun 83,
[页码]:47p
[馆藏索取号]:N83-33325
[总页数]:49


[唯一标识符]:CDSTIC.ISTP.219567
[文献来源]:科学技术会议录索引(ISTP)
[文献类型]:科技会议
[标题]:APPLICATION OF SIMULATION-BASED DEFECT PRINTABILITY ANALYSIS FOR MASK QUALIFICATION CONTROL
[作者]:J LU;A LU;LY PANG;D LEE;JH CHEN
[出版单位]:SPIE-INT SOCIETY OPTICAL ENGINEERINGBELLINGHAM
[ISSN_ISBN]:0-8194-4843-5
[会议名称]:Conference on Metrology, Inspection, and Process Control fof Microlithography XVII,SANTA CLARA, CA,February 24-27, 2003
[来源]:METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVII, PTS 1 AND 2,pp 33-40
[系列名称]:PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE)
[编辑者]:EDJ Herr
[主办单位]:Int SEMATECH;SPIE;Semicond Equipment & Mat Int
[地址]:,
[专业领域]:INSTRUMENTS & INSTRUMENTATION,OPTICS,IMAGING SCIENCE & PHOTOGRAPHIC TECHNOLOGY

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